- Physical Sciences
T: +34 946128811 E-mail: firstname.lastname@example.org
MAGNETOCALORIC EFFECT MEASURING SYSTEM
MAGNETO-OPTICAL KERR EFFECT (MOKE) MAGNETOMETER
System for measuring hysteresis curves as a function of temperature (in two stages: heating up to 875 K and cooling down to 4 K) and applied magnetic field (up to 0.15 T), it can be measured in polar and longitudinal configuration.
DC MAGNETRON SPUTTERING
Two DC power supplies of 1000 W and two RF power supplies of 300 W.
Base pressure is 2.7 x 10-7 mbar and operation pressure can be set between 2.4 x 10-2 and 8.4 x 10-3 mbar.
Targets available: Ni81Fe19 (Permalloy), Cu, Ti, Cr, Au, Al2O3, SiO2, etc.
Magnetic field can be applied during the deposition to generate a fixed magnetic anisotropy in the deposited material.
Target holder can rotate so it is possible to deposit different materials at the same sputtering process.
REACTIVE ION ETCHING (RIE)
600 W ICP (Ion Coupled Plasma) supply with auto tunner and 600 W Platen Bias supply with auto tunner.
Cooled down to -50º C or heated up to 200º C.
Base pressure is 10-7 Torr and capable to operate below 50 mTorr.
Etching gases available: CF4, CHF3, Ar, SF6, O2, CO and NH3.
Spectroscopic End Point detection.
SQUID MAGNETOMETER WITH 7 T SUPERCONDUCTING MAGNET
Unlimited temperature control between 5 and 400 K, extended to 2 K with a maximum time of 2 h.
Measured in DC. Sensitivity: 10-8 emu.
Furnace for measurements between 300 K and 800 K.
Multi-functional sample holder for electrical measurements.
VIBRATING SAMPLE MAGNETOMETER (VSM)
Superconducting Magnet up to 14 T. Low field sensitivity of 1E-5 Tesla. Maximum field ramp: 1 T/min.
Variable Temperature Insert (cryostat). Available range of 2-325 K in continuous mode. Maximum Cooling rate of 1.5 K/min.
Vibrating Sample Magnetometer. Frequency of 20 kHz. Sensitivity of 1E-6 emu.
AC Susceptometer. frequency range: 10-100 Hz. Maximum amplitude 1E-3 Tesla. Sensitivity: 10-7 emu/Oe.
DC Resistivity. Input impedance 10 GOhm. Current Source range from 10 fA to 0.1 A, DC and AC excitation.
KERR EFFECT MICROSCOPE
Optical microscope with 400x magnification and option of applying magnetics fields up to H = 0.6 T in parallel mode and H = 0.2 T when perpendicular to the plane of the sample, with the possibility of varying the temperature of the sample.
POSITRON ANNIHILATION LIFETIME SPECTROMETER
Measurement Range: 15K-320K.
DOPPLER COINCIDENCE SPECTROMETER
Measurement Range: 15K-320K.
FLOATING ZONE OPTICAL FURNACE
Optical system (4 halogen lamps) for growing of metal and oxide single crystals. Maximum length of 100mm and 4mm of diameter. Maximum operation temperature of 2100 C. Growing rate between 0.1 and 12 mm per hour.
DYNAMIC LIGHT SCATTERING (DLS)
Both DLS and SLS modes: Correlation & Intensity Measurements
Large angular Range: 8° to 155° with 25mm cells; 15° to 155° with 12 mm cells.
Fine Adjustment Control: Read angle to 0.01° directly on large, fine-control adjustment knob.
Multiple Laser Line Filters: Filter wheel with 632.8 (HeNe), 514.5/488.0 nm (Ar+), one open position for weak scatterers, and 2 blank (shutter) positions.
TURBO-PUMPED SPUTTER COATER/CARBON COATER
Metal sputtering or carbon evaporation.
Fine grain sputtering for advanced high resolution FE-SEM applications
Wide range of oxidizing and non-oxidizing metals.
Suitable for SEM, high resolution FE-SEM and also for many thin film applications
High vacuum carbon coating, ideal for SEM and TEM carbon coating applications
Thick film capabilities up to 60 minutes sputtering time without breaking vacuum
X-RAY PHOTOELECTRON SPECTROSCOPY (XPS)
Energy-analyzer Phoibos 1D-DLD 150, allowing analysis of samples from low area (micron order) to high area (mm).
Focus monochromatic radiation source 500 with dual anode Al / Ag, which allows working with powers of 400 W for the Al and 600 W for Ag, to improve the sensitivity and analysis time.
Manipulator sample-precision MCU-8, which allows linear movement in directions x, y, z, and polar azimuthal rotation with angular resolution analysis. System includes heating to 800 ° C and cooling.
PHOTOELECTRON SPECTROMETER (WITH IMAGE DISCRIMINATION)
Ultrafast Photoelectron Spectroscopy
ULTRASHORT PULSE OSCILLATOR-AMPLIFIER SYSTEM
It provides a pulse train of 30 fs at 800 nm with a replay frequency of 1KHz and per pulse energy of 3.5 mJ.
Later, the pulse frequency can be tunable in the range of 200nm-2000nm via parametric interactions series in non-linear crystals (the amplitude of the obtained pulses depends on the spectral region)
MICROMACHINING WITH ULTRASHORT PULSES
Allowing to reach a resolution up to 3μm (aprox.)
ZETA POTENTIAL AND PARTICLE SIZE ANALYZER
– Measurement range: 0.3nm – 10.0μm
– Measurement principle: Dynamic Light Scattering
– Minimum sample volume: 12µL
– Accuracy: Better than +/-2% on NIST traceable latex standards
– Precision / Repeatability: Better than +/-2% on NIST traceable latex standards
– Sensitivity: 0.1mg/mL (Lysozyme)
– Measurement range: 3.8nm – 100μm
– Measurement principle: Electrophoretic Light Scattering
– Minimum sample volume: 150µL (20µL using diffusion barrier method)
MAGNETOELASTIC RESONANCE MEASURING SYSTEM
Automated experimental system for measuring magnetoelastic resonance for frequencies over MHz range
Building 500 – 1st. Floor Bizkaia Science and Technology Park 48160 Derio, Spain