Materials growth and processing platform

• Physical Sciences

Contact for external services

Protocol / GCS

• Protocol for CIC nanoGUNE nanoscience external services (self-service / service mode – equipment usage).
• General Conditions for Services (IP-nanoGUNE).
• General Conditions for Services (IP-shared).
• General Conditions for Services (IP-client)

An infrastructure for the synthesis and processing of functional materials in the form of thin films and heterostructures, integrating deposition techniques (sputtering and atomic layer deposition, ALD) with thermal processing and etching techniques. It enables the design of interfaces and coatings with controlled composition and thickness, facilitating their integration into nanofabrication workflows and advanced materials development.

Equipment

• UHV sputtering system (AJA)
• Oerlikon UNIVEX 350 sputtering system
• EPVD75 (Kurt J. Lesker)
• Cambridge Nanotech Savannah S100 ALD system
• Beneq TFS 200 ALD system
• Oxford Plasmalab 80 Plus reactive ion etching (RIE) system
• Plasma asher
• UNITEMP RSO-650-200 furnace (up to 650 °C)
• Wet benches (RAMGRABER) and drying ovens

• Deposition of metallic, dielectric, and semiconductor thin films
• ALD deposition for precise control of film thickness and conformality
• Thermal processing and surface treatments
• Dry and wet etching
• Heterostructure growth and interface engineering
• Process integration into cleanroom workflows and support for advanced materials projects

CIC nanoGUNE

Tolosa Hiribidea, 76, E-20018 Donostia / San Sebastián

Surfaces and Coatings:

- Materials and Functional Surfaces

- Advanced Materials

Application sectors

• Construction
• Electronics and microtechnology
• Construction materials and products