UV Photolithography Mask Aligner

• Physical Sciences

Protocol / GCS

• Protocol for CIC nanoGUNE nanoscience external services (self-service / service mode – equipment usage).
• General Conditions for Services (IP-nanoGUNE).
• General Conditions for Services (IP-shared).
• General Conditions for Services (IP-client).

A UV photolithography mask aligner that enables pattern transfer with a resolution of approximately 1 µm onto wafers up to 4 inches in diameter. The system incorporates high-precision micromanipulators for positioning the mask and wafer in contact and soft-contact modes, as well as an alignment microscope with optical and digital zoom, ensuring registration accuracy of approximately 1 µm.

It will be integrated into CIC nanoGUNE’s Nanofabrication Platform / Cleanroom Facility, strengthening its capabilities for manufacturing nanostructured and microstructured devices for electronics, photonics, and microfluidics.

Equipment

• UV photolithography mask aligner
• Contact and soft-contact alignment modes
• Alignment microscope with optical/digital zoom and precision micromanipulators
• Typical resolution of approximately 1 µm
• Processing capability for wafers up to 4 inches and a wide range of mask sizes

• UV photolithography for pattern transfer onto wafers
• High-precision mask-to-wafer alignment
• Definition of microstructures (approximately 1 µm) for prototyping
• Support with exposure and alignment parameter optimization
• Training and guidance on equipment use in the cleanroom

CIC nanoGUNE

Tolosa Hiribidea, 76, E-20018 Donostia / San Sebastián

Cleanroom Facilities:

- Electronics and Embedded Systems

- Digital Technologies

Application sectors

• Electronics and microtechnology