Ion Bombardment and Sputtering System for Materials

• Physical Sciences

A high-vacuum system for surface modification and thin-film deposition using ion bombardment and sputtering. It incorporates an ultra-high-vacuum chamber (approximately $10^{-8}$ mbar) housing an accelerated ion gun and several sputtering sources. This enables both controlled surface etching and cleaning and the growth of functional layers.

The system will be integrated into CIC nanoGUNE’s Materials Growth and Processing Platform, expanding its surface engineering capabilities for nanoelectronic devices and advanced materials.

Equipment

• High-/ultra-high-vacuum system (approximately $10^{-8}$ mbar)
• Accelerated ion gun for cleaning and etching
• Multiple sputtering sources for thin-film deposition
• Sample holders and process parameter control
• Vacuum system monitoring and control

• Surface cleaning and conditioning by ion bombardment
• Controlled surface etching
• Deposition of functional layers by sputtering
• Process development and parameter optimization
• Surface engineering support for materials and devices

CIC nanoGUNE

Tolosa Hiribidea, 76, E-20018 Donostia / San Sebastián

Characterization and Inspection:

- Materials and Functional Surfaces

- Advanced Materials

Application sectors

• Electronics and microtechnology